Growth of hafnium dioxide thin films by MOCVD using a new series of cyclopentadienyl hafnium compounds was written by Carta, Giovanni;El Habra, Naida;Rossetto, Gilberto;Torzo, Giacomo;Crociani, Laura;Natali, Marco;Zanella, Pierino;Cavinato, Gianni;Matterello, Valentina;Rigato, Valentino;Kaciulis, Saulius;Mezzi, Alessio. And the article was included in Chemical Vapor Deposition in 2007.COA of Formula: C6H15NO This article mentions the following:
Thin films of HfO2 are grown by metal-organic (MO)CVD on Si(001) and fused quartz substrates at 400-500 °C, using a new series of bis-cyclopentadienyl bis-amino-alkoxide hafnium precursors, namely [(C5H5)2Hf{OC(CH3)2CH2N (CH3)2}2] and [(C5H5)2Hf{OCH(CH3)CH2N(CH3)2}2], stable in air because of their strong coordination to the metal center. The films obtained are investigated by X-ray diffraction (XRD), XPS, Rutherford backscattering spectroscopy (RBS), and at. force microscopy (AFM). Monoclinic phase HfO2 (baddeleyite) films, characterized by a correct stoichiometric ratio and a granular surface morphol. with a roughness/thickness ratio that decreases with increasing deposition rate, are obtained. In the experiment, the researchers used many compounds, for example, 1-(Dimethylamino)-2-methylpropan-2-ol (cas: 14123-48-9COA of Formula: C6H15NO).
1-(Dimethylamino)-2-methylpropan-2-ol (cas: 14123-48-9) belongs to alcohols. Similar to water, an alcohol can be pictured as having an sp3 hybridized tetrahedral oxygen atom with nonbonding pairs of electrons occupying two of the four sp3 hybrid orbitals. A multistep synthesis may use Grignard-like reactions to form an alcohol with the desired carbon structure, followed by reactions to convert the hydroxyl group of the alcohol to the desired functionality.COA of Formula: C6H15NO
Referemce:
Alcohol – Wikipedia,
Alcohols – Chemistry LibreTexts