Name: 2,5-Dimethyl-2,5-hexanediolIn 2020, Maekawa, Hiroyuki;Kudo, Hiroto;Watanabe, Takeo;Yamamoto, Hiroki;Okamoto, Kazumasa;Kozawa, Takahiro published 《Higher sensitive extreme ultraviolet (euv) resist materials derived from p-t-butylcalix[n]arenes (n = 4 and 8)》. 《Journal of Photopolymer Science and Technology》published the findings. The article contains the following contents:
We examined the synthesis, phys. properties, and resist properties of the various polymers and an oligomer containing fixed hole derived from calixarenes. By the condensation reaction of p-t-butylcalix[n]arene (n = 4 and 8) with 1,4-dichloro-2-oxabutane (DCB) and 2,5-dibromoacetyloxy-2,5-dimethylhexane (DBH), the soluble polymers poly(BCA[8]-co-DCB), poly(BCA[8]-co-DBH), and poly(BCA[4]-co-DCB), and an oligomer BCA[4]-DBH were obtained. They have good phys. properties (solubility, film-forming ability, high thermal stability), excellent thickness loss property, and good aciddeprotection reactivity upon ultra-violet (UV) irradiation The resist-sensitivity in an extreme UV (EUV) exposure tool indicated that poly(BCA[8]-co-DBH) and BCA[4]- DBH were good candidate to offer higher resolution resist pattern, i.e., E0 = 5.0 mJ/cm2 [poly(BCA[8[Bracket (R)[Bracket (R)-co-DBH and 0.8 mJ/cm2 (BCA[4]-DBH). The experimental procedure involved many compounds, such as 2,5-Dimethyl-2,5-hexanediol (cas: 110-03-2) .
2,5-Dimethyl-2,5-hexanediol(cas:110-03-2) on heteropoly acid catalyzed dehydration yields cyclic ethers via stereospecific intramolecular SN2 mechanism. It reacts with nitriles in concentrated sulfuric acid to yield Δ1-pyrrolines.Name: 2,5-Dimethyl-2,5-hexanediol
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